HHV achieves ISRO's 'Certification of Qualification'

"Only a handful of companies across the world have had the privilege of serving for ISRO and HHV becomes the first Indian company to cross that barrier,” said Prasanth Sakhamuri, MD, HHV

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Bengaluru based Hind High Vacuum Co. Pvt. Ltd. (HHV), announced that is has achieved the prestigious ‘Certification of Qualification' awarded by Space Application Centre (SAC), ISRO for its 3 layer metallization process on Alumina substrates for flight hardware realization.

This outstanding product ‘3-layer metallization on alumina substrate' better known as Thin Film Metalized Circuits realized by populating with various components for use in high frequency RF circuits, was entirely developed by HHV's dedicated team of R&D professionals out of its facility in Bengaluru.

The certification was accorded with honor by A.K. Lal, Group Director SRG, SAC to Prasanth Sakhamuri, Managing Director, N.J Babu, COO and Ramakrishna Siddam, Business Head of HHV.

"HHV is humbled to be recognized and be of service to an organization like ISRO which is bringing glory to India across the world with its technical prowess and execution excellence. Only a handful of companies across the world have had the privilege of serving for ISRO and HHV becomes the first Indian company to cross that barrier," said Prasanth Sakhamuri, Managing Director of HHV.

"The technology required for the end product is an amalgamation of both thought leadership and precise execution leading to a superior finished product. This has been possible through the best in class manufacturing practices and technical intellect at HHV leading to a world class product.''

"The manufacturing unit set up by HHV for this process required matching stringent specifications for space qualification and highest level of precision to produce reliable and consistent quality products. The necessary up gradation of the production systems was taken up to bring in futuristic technologies. An ISO Class 6 clean room was specifically established for the purpose of depositing defect free metallization coatings" added Sakhamuri.

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